[ Dual Heads Particle Scanner ]
It's not limited to SiC, can aiso measure transparent glass wafer, the silicon wafer.
・Minimum detection particle size : 0.1μm.
・The measurement within 5 minutes, including the latent flaw detection measurement of 4 inches SiC wafer.

Small particle surface scanner equipped with a new small particle sensor.
Possible measurement of transparent glass substrate.

Glass plate particle inspection system
・Silicon wafers, glass plates, etc.
・Minimum detectable particle size : 0.5μm.

Top and back isolation(Automatic)
・Available for separating front and back with autofocus sensor.
・Minimum detection particle size : Quartz 0.2μm.
・Testable substrate:Quartz, Sapphires, SiC substrates, Sic substrates with epitaxial layer, etc.

Top and back isolation(Manual)
・Available for separating front and back with autofocus sensor.
・Minimum detection particle size : Quartz 0.2μm.
・Testable substrate:Quartz, Sapphires, SiC substrates, Sic substrates with epitaxial layer, etc.

Available for mirror substrate(sillicon wafers, etc.)
・High speed scanning.
・Substrate size : 2〜8 inch
・Minimum detection particle size : Si wafers : 0.1μm.
・Testable substrate:Si wafers, Variety of wafers with films.

Available for mirror substrate(sillicon wafers, etc.)
・High speed scanning.
・Substrate size : 2〜8 inch
・Minimum detection particle size : Si wafers : 0.1μm.
・Testable substrate:Si wafers, Variety of wafers with films.